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Huawei is constantly researching chip printing technologies, and the two recent patents indicate that the research is making rapid progress. In addition, Huawei is also seeking new patents for UV lithography machines.


The lithography technique is the most important step in slide fabrication. The reason why chip technology has been able to gradually evolve from 100 microns to 3 nanometers in the past 60 years is due to lithographic machines. Without a lithographic machine, there is no chip manufacturing.

Therefore, Huawei is looking for new chip printing and manufacturing technologies.

Let’s take a quick look at these patents.

First patent:

Patent filed May 13, 2021, now published. The technical details of this patent cover technologies related to extreme ultraviolet light.

The details show the lithographic device, and its control method, which is related to the field of optics and can solve the problem that coherent light cannot be uniform due to the formation of a fixed interference pattern.

Huawei chipset print technology research

The reflective surface of the reflective mirror has many fine reflective surfaces. The group of micro-reflective surfaces includes a first micro-reflective surface and a second micro-reflective surface adjacent to the first micro-reflective surface.

There is a height difference AH between the first partial reflective surface and the second micro-reflective surface, and the height difference Δh that is in the interval (0, ka]where is the wavelength of the intense ultraviolet light, while k is a positive integer greater than or equal to 1.

Second patent:

The second patent is titled “Mirror, Photolithography Apparatus and Control Method.” It has patent application number CN202110524685.X. This can solve the problem that coherent light cannot be smoothed due to the formation of a fixed interference pattern, which is also a common problem in EUV lithography.

The patent shows a device for lithography, which homogenizes the accumulated light intensity in the field of view during the exposure time by continuously changing the interference pattern formed by the coherent light.

This device to achieve the purpose of uniform light. It also solves a related art problem that light cannot be uniform due to coherent light forming a consistent interference pattern.

It can be seen that Huawei has been looking to solve the chip neck problem of lithographic machines because it is an essential part of the breakthroughs in chip development.

Huawei chipset print technology research


Huawei seems to be pushing itself to the limits in the field of lithographic machines. Meanwhile, lithography technology shows that Huawei will make great progress, along with other companies in the future.

Thus, it is likely that Huawei can achieve a 100% Chinese chip printing machine in the near future.